Activation energy and ion migration
In
Formation energy: 0.1 - 0.2 eV
Migration : 0.1-0.6 eV for halide (
The different migration path of I-.
The activation energy depends on how much lattice distortion is required during movement of the defect.
For experimental result, the value diverse. The reason:
- Small temperature range. The Arrhenius relation not clear.
- Device response can be influence by: starting position and source of the defects, diffusion and drift contribution, additional temperature formation, etc
- Measured systems commonly nanocrystalline, not a single crystal. There are ground boundaries.
Big problem:
the device to device variation was too large. The value would be depend on the exact experiment procedure.